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Laser-assisted chemical vapor deposition of thick poly-Si layers for solar cells

TitoloLaser-assisted chemical vapor deposition of thick poly-Si layers for solar cells
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione2002
AutoriDella Sala, Dario, Loreti S., Fornarini L., Menicucci I., Santoni A., P. Veneri Delli, Minarini Carla, Privato C., and Lancock J.
RivistaThin Solid Films
Parole chiaveChemical vapor deposition, Crystallization, glass, Laser beam effects, Laser crystallization, Light absorption, Polysilicon, Scanning electron microscopy, Silicon solar cells, Substrates, X ray diffraction analysis

The growth of polycrystalline silicon on glass by laser-assisted chemical vapor deposition has been studied with the aim of identifying a light absorber layer for solar cells, with superior material quality compared to other technologies available for low-temperature substrates. One-dimensional calculations of the thermal wave produced by laser irradiation have been used to elucidate the complex interaction of the molten silicon surface layer with the substrate during the growth. The experiments show the relevant role played by the seed layer used as the growth initiator. The morphology of the laser-crystallized films has been analysed by scanning electron microscopy and X-ray diffraction. Polysilicon films, 2 μm thick, with a compact structure consisting of 1-2-μm grains that are almost monocrystalline, have been obtained. © 2002 Elsevier Science B.V. All rights reserved.


cited By 6; Conference of Proceedings of Symposium P on Thin Film Materials for Photovolt E-MRS ; Conference Date: 5 June 2001 Through 8 June 2001; Conference Code:59000

Citation KeyDellaSala2002302