Laser-assisted chemical vapor deposition of thick poly-Si layers for solar cells

TitleLaser-assisted chemical vapor deposition of thick poly-Si layers for solar cells
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2002
AuthorsDella Sala, Dario, Loreti S., Fornarini L., Menicucci I., Santoni A., P. Veneri Delli, Minarini Carla, Privato C., and Lancock J.
JournalThin Solid Films
Volume403-404
Pagination302-306
ISSN00406090
KeywordsChemical vapor deposition, Crystallization, glass, Laser beam effects, Laser crystallization, Light absorption, Polysilicon, Scanning electron microscopy, Silicon solar cells, Substrates, X ray diffraction analysis
Abstract

The growth of polycrystalline silicon on glass by laser-assisted chemical vapor deposition has been studied with the aim of identifying a light absorber layer for solar cells, with superior material quality compared to other technologies available for low-temperature substrates. One-dimensional calculations of the thermal wave produced by laser irradiation have been used to elucidate the complex interaction of the molten silicon surface layer with the substrate during the growth. The experiments show the relevant role played by the seed layer used as the growth initiator. The morphology of the laser-crystallized films has been analysed by scanning electron microscopy and X-ray diffraction. Polysilicon films, 2 μm thick, with a compact structure consisting of 1-2-μm grains that are almost monocrystalline, have been obtained. © 2002 Elsevier Science B.V. All rights reserved.

Notes

cited By 6; Conference of Proceedings of Symposium P on Thin Film Materials for Photovolt E-MRS ; Conference Date: 5 June 2001 Through 8 June 2001; Conference Code:59000

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0036467643&doi=10.1016%2fS0040-6090%2801%2901568-1&partnerID=40&md5=45900ad0158aac7dc6f6e411ddc3414e
DOI10.1016/S0040-6090(01)01568-1