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The influence of ion mass and energy on the composition of IBAD oxide films

TitoloThe influence of ion mass and energy on the composition of IBAD oxide films
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione1998
AutoriRizzo, Antonella, Alvisi Marco, Sarto F., Scaglione S., and Vasanelli L.
RivistaSurface and Coatings Technology
Volume108-109
Paginazione297-302
ISSN02578972
Parole chiaveArgon, Hafnium compounds, Hafnium dioxide, Ion beams, Ion bombardment, Ion-beam assisted deposition (IBAD), Light absorption, Mathematical models, Optical coatings, Sigmund's model, Silica, Sputter deposition, Ultraviolet radiation, Xenon, Zirconia
Abstract

Dual ion-beam sputtering deposition is a very promising technique for fabricating optical coatings thanks to its very good control of the deposition parameters. Unfortunately, the different sputtering yields of the elements composing the films modify the stoichiometry and, consequently, may cause an increase of the absorption in the UV range and an undesirable variation of the refractive index. In this work we investigate the influence of ion-beam assistance on some oxide materials: SiO2, ZrO2, and HfO2. The sputtering yield has been measured by varying the mass (Ar, Xe) and energy (100-1000 eV) of the bombarding ions. The yield measurements were compared with the calculated yields using Sigmund's model. Different screening functions for different characteristic energy ranges were necessary to fit the experimental results.

Note

cited By 5

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0032184470&partnerID=40&md5=c360da3429a4993d0e227efdc16b7275
Citation KeyRizzo1998297