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Sub-50-nm conjugated polymer dots by nanoprinting

TitleSub-50-nm conjugated polymer dots by nanoprinting
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2008
AuthorsMele, E., Camposeo A., De Giorgi M., Di Benedetto Francesca, De Marco C., Tasco V., Cingolani R., and Pisignano D.
JournalSmall
Volume4
Pagination1894-1899
KeywordsABS resins, Aqueous suspensions, article, Bake treatments, chemistry, Conjugated polymers, Dissolution, fluorescence, Fluorescence quantum yields, Fluorescent polymer particles, Integrating spheres, Lateral dimensions, Light emission, Lithography, Luminescence, Nanomaterial, Nanoprinting, Nanostructures, nanotechnology, Nonwetting templates, Optical characterizations, Optical lithographies, Organic polymers, Photomasks, Photoresist patterns, Photoresists, Plastic coatings, polymer, Polymers, Si substrates, silicon, Solid states, Spin dynamics, Surface modification, Surface treatment
Abstract

The realization of isolated light-emitting dots, with lateral dimension down to a few tens of nanometers, by direct particle replication in nonwetting templates (PRINT) on dissolved conjugated polymers, and on their optical characterization. The master (i) was fabricated starting from a photoresist pattern generated by optical lithography on Si substrate with EVG620 equipment. A layer of SU-8 2002 was deposited onto the surface by spin-coating. A final hard-bake treatment was carried out at 150°C for 5 minutes. A 70 nm layer of electronic resist was deposited onto the mask surface by spin-coating at 5500 rpm for 40 seconds, and thermally cured at 180°C for 3 minutes. The fluorescence quantum yield (FpL) of the conjugated polymers in the solid state was measured with an integrating sphere. It was observed that stable aqueous suspensions of fluorescent polymer particles could be obtained.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-55849133709&doi=10.1002%2fsmll.200800210&partnerID=40&md5=5fcf1838ffb60418004be29089c5808c
DOI10.1002/smll.200800210
Citation KeyMele20081894