Carbon nanotubes growth by HFCVD: Effect of the process parameters and catalyst preparation

TitleCarbon nanotubes growth by HFCVD: Effect of the process parameters and catalyst preparation
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2004
AuthorsMakris, Th. Dikonimos, Giorgi R., Lisi N., Pilloni L., Salernitano E., Sarto F., and Alvisi Marco
JournalDiamond and Related Materials
Volume13
Pagination305-310
ISSN09259635
KeywordsCarbon nanotubes, Catalysts, Chemical vapor deposition, Crystal growth, diamond, Hot filament chemical vapor deposition (HFCVD), methane, Nickel, Silica, Sputtering, Substrates
Abstract

Carbon nanotubes (CNTs) were grown on nickel catalysts by hot filament chemical vapour deposition (HFCVD) using H2 and CH4 as gas precursors. CNTs with different characteristics were observed varying some growth parameters, such as the substrate temperature, the total pressure and the methane concentration. These parameters were optimised in order to obtain untangled CNTs with high density and smooth walls. Catalyst nanoparticles were obtained through the clustering of Ni thin films deposited by sputtering techniques. CNTs grown on samples with the silicon native oxide or with a SiO2 coating between Si substrate and Ni film were compared. Catalytic layers and CNTs were characterised by SEM and XPS. © 2003 Elsevier B.V. All rights reserved.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-1542378065&doi=10.1016%2fj.diamond.2003.10.013&partnerID=40&md5=955559d011a1905127a0521e16184cf1
DOI10.1016/j.diamond.2003.10.013