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Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films

TitoloLaser damage dependence on structural and optical properties of ion-assisted HfO2 thin films
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione2001
AutoriAlvisi, Marco, de Tomasi F., Perrone M.R., Protopapa Maria Lucia, Rizzo Antonella, Sarto F., and Scaglione S.
RivistaThin Solid Films
Volume396
Paginazione44-52
ISSN00406090
Parole chiaveExcimer lasers, Hafnium compounds, Ion-assisted thin films, Laser beam effects, Physical vapor deposition, Radiation damage, Silica, Substrates, Thin films
Abstract

Laser damage studies at 248 nm (KrF excimer laser) have been performed on HfO2 films of 300 nm thickness deposited on silica substrates by the Xe ion-assisted electron beam evaporation technique. The assistance parameters (ion mass, energy and current density) have been adjusted to investigate the effect of the Xe-ion momentum transfer parameter P on the film optical and structural properties. Then, the dependence of laser damage fluence on film properties has been studied. Higher laser damage fluences have been found for the HfO2 films deposited at lower P values and characterized by a fully crystalline structure with the grain of smaller size and randomly oriented. © 2001 Elsevier Science B.V. All rights reserved.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0035928990&doi=10.1016%2fS0040-6090%2801%2901184-1&partnerID=40&md5=be7e3c5ecbe0d1919b51ec299b14ee60
DOI10.1016/S0040-6090(01)01184-1
Citation KeyAlvisi200144