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Imprinting strategies for 100 nm lithography on polyfluorene and poly(phenylenevinylene) derivatives and their blends

TitleImprinting strategies for 100 nm lithography on polyfluorene and poly(phenylenevinylene) derivatives and their blends
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2007
AuthorsMele, E., Camposeo A., Del Carro P., Di Benedetto Francesca, Stabile R., Persano L., Cingolani R., and Pisignano D.
JournalMaterials Science and Engineering C
Volume27
Pagination1428-1433
ISSN09284931
Keywordscolor, Crystals, Degradation, Derivatives, Luminescence, Nanoimprint lithography, Nanophotonics, Organic gratings, Particulate emissions, Phenylenevinylene, Polyfluorene, Thermal effects
Abstract

We report on the use of nanoimprint lithography at room temperature (RT-NIL) for the direct structuring of polyfluorene and poly(phenylenevinylene) derivatives and of their blends without the degradation of the emissive characteristics of the active molecules. We apply RT-NIL for the fabrication of periodic one- and two-dimensional gratings with feature width that varies from 100 to 500 nm. Moreover, we analysed the effects that a superimposed periodic corrugation induces on the emitted light in terms of spectral properties and luminescence efficiency, thus ruling out any degradation of the emission. In particular, the combination of nanopatterning and active blends opens new perspectives for the control of the emitted colour from conjugated polymer films. © 2006 Elsevier B.V. All rights reserved.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-34547726200&doi=10.1016%2fj.msec.2006.07.012&partnerID=40&md5=30b834a9216219555caa9b60e9ee774e
DOI10.1016/j.msec.2006.07.012
Citation KeyMele20071428