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Structural and optical properties of silver thin films deposited by RF magnetron sputtering

TitleStructural and optical properties of silver thin films deposited by RF magnetron sputtering
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2001
AuthorsRizzo, A., Tagliente M.A., Alvisi Marco, and Scaglione S.
JournalThin Solid Films
Volume396
Pagination29-35
ISSN00406090
KeywordsMagnetron sputtering, Optical characterization, Polycrystalline materials, silver, Stress analysis, Surface roughness, Thin films, X ray diffraction analysis
Abstract

In this work, we investigate the optical and the structural properties of Ag films by means of spectrophotometric techniques and X-ray diffraction methods in the low- and high-angle regimes. The coatings were grown by radio frequency magnetron sputtering on (100)-oriented silicon substrates. Several sets of samples were produced by varying the sputtering pressure (0.15-0.9 Pa) and changing the sputtering power supply in the range of 25-100 W. In particular, the dependence of the coating optical features, surface roughness, texture and residual stress on the parameter β, proportional to the momentum transferred to the growing film from the energetic particles bombarding it, was pointed out. The results indicate that the Ag films are polycrystalline with a moderate [111] texture and compressive in-plane stress was measured for all the investigated samples. The behavior of the stress with the momentum parameter can be summarized as follows: (i) the compressive stress increases in the range 0<β<300V2s/Å; (ii) at β∼400 V2s/Å it shows a very pronounced maximum; (iii) in the range 400<β<800 V2s/Å it decreases until reaching a saturation value for β>1000 V2s/Å. © 2001 Elsevier Science B.V. All rights reserved.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0035929016&doi=10.1016%2fS0040-6090%2801%2901242-1&partnerID=40&md5=51a712a519e5505d1e0b8fb07134c996
DOI10.1016/S0040-6090(01)01242-1
Citation KeyRizzo200129